Effect of ion beam assisted deposition on the growth of indium tin oxide (ITO) nanowires
نویسندگان
چکیده
4108 | CrystEngComm, 2014, 16, 4108–4112 This journal is © The R Department of Materials Science and Engineering and Division of Advanced Materials Science, Pohang University of Science and Technology (POSTECH), Pohang, 790-784, South Korea. E-mail: [email protected]; Fax: +82 54 279 5242; Tel: +82 54 279 2152 † Present Address: Max-Planck-Institut Für Biophysikalische Chemie, am Fassberg 11, 37077, Göttingen, Germany. Cite this: CrystEngComm, 2014, 16, 4108
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